Quantum Lithography beyond the Diffraction Limit via Rabi Oscillations - 集成量子纳米光子学理论研究 | LabXing

array(2) { ["lab"]=> string(4) "1630" ["publication"]=> string(5) "14624" } Quantum Lithography beyond the Diffraction Limit via Rabi Oscillations - 集成量子纳米光子学理论研究 | LabXing

集成量子纳米光子学理论研究

简介

关注

Quantum Lithography beyond the Diffraction Limit via Rabi Oscillations

2010

期刊 Physical Review Letters

作者 Zeyang Liao · M. Al-Amri · M. Suhail Zubairy

下载全文

卷 105
期 18
American Physical Society (APS)
ISSN: 0031-9007
DOI: 10.1103/physrevlett.105.183601

LabXing 上可以免费创建课题组网站