array(2) { ["lab"]=> string(4) "1352" ["publication"]=> string(5) "13143" } Physically Based Evaluation of Effect of Buried Oxide on Surface Roughness Scattering Limited Hole Mobility in Ultrathin GeOI MOSFETs - 铁电器件课题组(王晓磊) | LabXing

Physically Based Evaluation of Effect of Buried Oxide on Surface Roughness Scattering Limited Hole Mobility in Ultrathin GeOI MOSFETs

2017
期刊 IEEE Transactions on Electron Devices
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  • 卷 64
  • 期 6
  • 页码 2611-2616
  • Institute of Electrical and Electronics Engineers (IEEE)
  • ISSN: 0018-9383
  • DOI: 10.1109/ted.2017.2688489