恭喜孙晓清博士的文章“The effect of interface traps at the Si/SiO2 interface on the transient negative capacitance of ferroelectric FETs”发表在IEEE TED杂志上
孙晓清博士的IEEE TED文章发表
创建: Aug 15, 2021 | 15:46
array(2) { ["lab"]=> string(4) "1352" ["news"]=> string(3) "883" }
恭喜孙晓清博士的文章“The effect of interface traps at the Si/SiO2 interface on the transient negative capacitance of ferroelectric FETs”发表在IEEE TED杂志上